您的当前位置:首页Method of Fabricating an Integrated Device

Method of Fabricating an Integrated Device

2024-07-22 来源:六九路网
专利内容由知识产权出版社提供

专利名称:Method of Fabricating an Integrated Device发明人:Joshua LU,Gregory BEACH,Alexander

PAYNE,James HUNTER

申请号:US13648932申请日:20121010

公开号:US20130034958A1公开日:20130207

专利附图:

摘要:A method of fabricating an integrated device including a

MicroElectroMechanical system (MEMS) and an associated microcircuit is provided. In oneembodiment, the method comprises: forming a high temperature contact through a

dielectric layer to an underlying element of a microcircuit formed adjacent to a

MicroElectroMechanical System (MEMS) structure on a substrate; and depositing a layerof conducting material over the dielectric layer, and patterning the layer of conductingmaterial to form a local interconnect (LI) for the microcircuit overlying and electricallycoupled to the contact and a bottom electrode for the adjacent MEMS structure. Otherembodiments are also provided.

申请人:Silicon Light Machines Corporation

地址:Sunnyvale CA US

国籍:US

更多信息请下载全文后查看

因篇幅问题不能全部显示,请点此查看更多更全内容